A vacuum deposition apparatus for depositing metal thin films or catalyst thin films on substrates with a high degree of accuracy and in a largequantity of samples.

Features:

・　Turbo-molecular pump is equipped so that clean vacuum is realized.

・　 Allpumping processes run automatically only by pushing the start button.

・　Two kinds of metal sources can bealternately deposited.

・ Highly-sensitivefilm-thickness monitoris equippedfor sub-nanometer thin film deposition.

・　Ourunique in-situ rotatable cubic sample holder gives 4 times increase of the yield per lot.

・　Special sample holder for sample preparation in a groove box is also possible optionally,by which samples will never be exposed tothe airuntilthe deposition process is finished.

Main Specifications:

Vacuum chamber
Pyrex glass chamber 210mmφ150mm.

Substrate holder
360°rotatale cubic substrate holder, 4 faces, 100mmx100mm for each face.

Evaporation source
2 sets of electrodes, 2 evaporation sources.

Vacuum system
Turbo molecular pump 67L/sec, rotary pump 38L/sec., penning gauge, automatic operation

Degree of vacuum
1×10-4Pa(7.5×10-7Torr)

Film thickness monitor
crystal oscillator, minimum 0.01nm, max. 100nm

Power requirement
220V, 200 Watt